设备详细介绍

电子束蒸发镀膜仪

E-Beam Vapor System

发布时间:2013-01-23 | 【打印】 【关闭】

 

  型   号:Auto 500

  功   能:

  • 各种高熔点金属和非金属薄膜的蒸镀
    Deposition of metal films with high melting points and non - metal films
  • 各种多层膜,包括光学膜、介质膜和电极膜的蒸镀
    Deposition of multi- layer films, including optical, dielectric and electrode films

  主要配置:

  • 载片(Wafers)直径小于100mm的各种基片 (up to 100 mm wafers)
  • 电子枪功率(Power of electron guns)3 kW5 kV
  • 极限真空(Ultimate vacuum)5 ×10-5 Pa
  • 基片最高温度(Temperature available): Temperature of cooling water up to 250 ℃
  • 坩埚溶积(Volume of crucibles)4 cm3
  • 薄膜均匀度(Uniformity): < 5%

  技术特点:

  • 基片水冷,可低温蒸镀
    Substrate cooling, and low temperature deposition capability
  • 可实现晶粒细化蒸镀
    Grains refining deposition capability