论文

Pattern design in large area using octadecyltrichlorosilane self-assembled monolayers as resist material

论文编号:
作者: Jiang, P
刊物名称: APPLIED SURFACE SCIENCE
所属学科: Chemistry, Physical; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
论文题目英文: Pattern design in large area using octadecyltrichlorosilane self-assembled monolayers as resist material
年: 2006
卷: 252
期: 12
页: 4230
联系作者: Jiang, P
收录类别:
影响因子:
参与作者: Jiang, P.Li, SY.Sugimura, H.Takai, O
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